This study delves into the characterization of surface layers within Mo/Si multilayer structures, employing Total Electron Yield (TEY) and X-ray Reflectivity (XRR) techniques. Mo/Si multilayers are pivotal components in advanced optical systems, such as extreme ultraviolet (EUV) lithography. Understanding and optimizing their surface properties are paramount for enhancing performance. Through a meticulous analysis, we unveil the structural and compositional details of the surface layer and explore their implications for optical performance. This research contributes to the refinement of Mo/Si multilayer designs and paves the way for improved optical systems in diverse applications.

Surface characterization, Total Electron Yield (TEY), X-ray Reflectivity (XRR)

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